Scion Plasma

Startup
Summarized by Halo AI

Scion Plasma specializes in advanced plasma technology, offering ion sources, sputtering magnetrons, and cloud-based simulation software to support thin-film deposition and materials processing for industrial and academic research.

Founded & HQ
East Lansing, MI, USA
Company size
1-10 employees
Funding
~$475K
IP status
1 patent filed · 2 grants confirmed
Activity highlights
Secured multiple SBIR grants, including a $250,000 Phase I award from the DOE in 2023 and a $225,000 award from the NSF in 2019 to develop advanced ion sources.

Scion Plasma LLC is a technology company founded in 2018 as a spin-off from Michigan State University that specializes in advanced plasma solutions for industrial and academic applications. The company develops and manufactures a core portfolio of patented broad-beam ion sources, high-efficiency magnetron sputtering cathodes, and power supplies designed for seamless integration into vacuum systems. Complementing its hardware, Scion Plasma offers ASTRA, a cloud-based simulation software platform that utilizes particle-in-cell Monte Carlo collision (PIC-MCC) methods. By integrating innovative algorithms, this software overcomes traditional computational constraints, allowing researchers and engineers to rapidly simulate low-temperature plasma discharges at industrial scales.

These solutions are engineered to support thin-film deposition, surface engineering, and process optimization in sectors such as semiconductors, electronics, and solar energy. By providing precise control over ion energy and flux, Scion Plasma’s technologies enable benefits like improved film quality, enhanced optical transmittance, and the capability for room-temperature material growth. The company collaborates with researchers and manufacturers to deliver scalable, cost-effective technologies, often supported by government-funded research programs. Their tools help address common manufacturing challenges, such as process stability and material density, ultimately accelerating the development of advanced thin-film materials and plasma-based devices.

AI summary generated on Jun 22, 2026
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For general inquiries

MS
Maheshwar Shrestha
Principal Investigator
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