Low-temperature uv-assisted deposition of hydrophobic metal oxide films on cellulose-based substrates

Technology
In development
University

A scalable coating technology that forms dense, hydrophobic metal oxide films on paper, cotton, and other cellulose-based substrates using a low-temperature, deep-UV-assisted annealing process. The method achieves water contact angles of approximately 120 degrees and sustained liquid resistance beyond 48 hours, without hazardous precursors or surface pre-treatment.

Overview

This technology enables the formation of durable hydrophobic metal oxide films on cellulose-based substrates such as paper, woven cotton, and rough cotton fibers. By using a novel low-temperature, deep-UV-assisted annealing step, dense metal oxide coatings can be deposited onto target surfaces without the need for hazardous precursors or pre-treatment of the substrate. The resulting films deliver strong water repellency and impermeability to aqueous solutions, opening new possibilities for water-resistant paper products, protective textiles, and packaging applications.

Technical specifications

Coating process:

  • Aqueous metal oxide cluster precursor solution is applied via spray-coating, dip-coating, drop-casting, or inkjet printing
  • Samples are annealed under deep-UV light (189 and 254 nm) or in a box oven at 300 degrees Celsius
  • Multiple layers can be added as needed after drying

Film characteristics:

  • Uniform, dense metal oxide film with a typical thickness of 100 to 250 nanometers
  • Water contact angle of approximately 120 degrees
  • Continuous liquid contact resistance exceeding 48 hours

Precursor properties:

  • Synthesized through highly scalable methods yielding microcrystalline powder or aqueous solution
  • Dissolvable or dilutable in water or water/organic solvent mixtures
  • Non-hazardous precursor materials

Validated substrates:

  • Silicon wafers
  • Woven cotton fiber
  • Rough cotton fiber
  • Paper products
Technology readiness level

The technology has been experimentally validated on multiple substrate types including silicon wafers, woven and rough cotton fibers, and paper products. Characterization using photoelectron spectrometry and scanning electron microscopy has confirmed uniform, dense film formation, while goniometry and wash testing have demonstrated feasibility for meeting liquid resistance requirements. Future validation will extend testing to additional substrates and refine the deposition parameters for broader application readiness. The research team is seeking a partner to provide funding for personnel, access to chemicals and substrates, and equipment usage to advance the technology toward commercialization.


About University of Oregon

The University of Oregon is a comprehensive public research university serving more than 20,000 students, pairing liberal-arts breadth with research-intensive programs. A dedicated campus for accelerating scientific impact co-locates labs, prototyping spaces, and entrepreneurship support with corporate engagement to speed collaboration. Shared-use core facilities and maker resources offer external access, and a Portland presence connects faculty and students to regional industry via internships and sponsored work. Research is supported by the National Science Foundation, the National Institutes of Health, and other competitive federal sources, alongside state and industry agreements. A technology transfer office provides IP strategy, licensing, and startup support.

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