Dry EUV photoresists based on secondary-electron-induced phase change
Innovative EUV photoresists using secondary-electron-induced phase change enhance lithography precision. They exhibit high EUV absorptivity and compatibility with various etching processes, enabling ultrathin uniform coatings for high-resolution patterning.
Overview
The proposed technology introduces a novel class of EUV photoresists that leverage secondary-electron-induced phase change to improve the precision of lithographic processes. This innovation addresses common challenges in EUV lithography, such as line-edge roughness, by utilizing elements like Sb, Te, and V, which strongly absorb EUV photons. The resulting phase change in the photoresist material creates distinct regions with varying etch resistance or solubility, enhancing pattern fidelity and resolution.
Technical specifications
- Secondary-electron-induced phase change: Initiated by high-energy secondary electrons from EUV photon absorption, leading to distinct phase transitions.
- High EUV absorptivity: Incorporates elements with strong EUV absorption to improve photoresist efficiency.
- Compatibility with etching processes: Supports both wet and dry etching methods with high selectivity due to phase contrast.
- Deposition methods: Utilizes atomic layer deposition (ALD) or chemical vapor deposition (CVD) for uniform ultrathin coatings.
- Multiple phase change mechanisms: Includes structural and insulator-to-metal transitions.
Technology readiness level
The technology is at TRL 3, indicating that experimental proof of concept has been demonstrated through controlled laboratory testing. Future validation plans include Monte Carlo simulations, precise film deposition, and pattern evaluation using e-beam lithography, aiming for sub-20 nm pitch performance.
About University of California, Santa Barbara
UC Santa Barbara is a comprehensive public research university with a collaborative, innovation‑driven culture. Industry partners engage through co‑located cleanrooms and prototyping suites, campus‑wide shared instrumentation, and flexible sponsored‑research agreements coordinated by an industry partnerships team. The coastal campus sits within a Central Coast technology corridor, supporting close collaboration, recruiting pipelines, capstone engagements, and short‑course training tailored to corporate needs. Research is sustained by competitive federal funding from NSF, DOE, DOD, and NIH. A dedicated technology transfer office manages IP, licensing, and startup formation to speed commercialization.
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