Plasma-assisted chemical vapor deposition for particle surface modification
GVD Corporation introduces a PACVD technology for modifying particulate surfaces with nanometer-scale coatings, offering solvent-free, scalable solutions adaptable to various particle sizes and compositions.
Overview
GVD Corporation's innovative solution leverages plasma-assisted chemical vapor deposition (PACVD) to modify particulate surfaces through nanometer-scale coatings in vacuum reactors. This technology facilitates both coating development and surface functionalization, providing a versatile, solvent-free process that reduces hazardous waste. The PACVD method is particularly effective for difficult-to-coat metallic powders and allows for precise surface composition control by adjusting gas chemistry and plasma parameters.
Technical specifications
- Key features:
- Utilizes low-temperature plasma for enhanced versatility
- Operates in a dry vacuum environment, removing constraints of surface energy and solubility
- Capable of handling particles of various sizes and compositions
- Precise control over surface composition with gas chemistry and plasma parameter adjustments
- Solvent-free process minimizes hazardous waste
- Applications:
- Suitable for metallic powders, especially Group C (Geldart scale) particles
- Enables pre-cleaning and surface modification with water vapor, oxygen, or hydrogen
Technology readiness level
This technology is currently at TRL 5, indicating that it has been validated in a relevant environment. GVD Corporation plans to further validate the technology through a structured test plan, including defining technical goals, determining compatibility with vacuum processing, and executing experimental plans to prove the concept for specific applications.
About GVD Corporation
GVD Corporation specializes in the development and application of ultrathin polymer coatings using proprietary chemical vapor deposition (CVD) technology. Founded in 2001 as a spin-out from MIT, the company utilizes a solvent-free, low-temperature manufacturing process to deposit high-performance films directly from the vapor phase. This approach allows for the creation of nanometer- or micron-thin coatings that are hydrophobic, lubricious, and provide dielectric insulation without exposing substrates to harsh conditions. Their technology is distinct for its scalability and ability to be tailored for specific applications, enabling the company to provide both custom coating services and specialized CVD equipment for research and development laboratories.
These advanced coating solutions are critical for customers across various sectors, including aerospace, defense, medical devices, industrial manufacturing, and consumer products. By enhancing surface properties—such as adding dry lubrication to seals or protecting electronics in extreme environments—GVD helps partners improve product performance, durability, and manufacturing efficiency. The company supports clients through the entire product lifecycle, from initial R&D and prototype processing at their Cambridge facility to technology licensing and the integration of custom coating systems into existing production lines. Through collaborative projects and technical expertise, GVD addresses complex, application-specific challenges to help advance products from conceptual design to commercial realization.
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