Broad beam plasma source enhanced growth of gan thin films
Innovative broad-beam ion source technology enhances the crystallization of GaN thin films on silicon substrates, enabling cost-effective production and improved active layers for semiconductor applications.
Durable coatings for enhanced polyisocyanurate foam demolding
A patented beam plasma source technology is used to create hydrophilic metal oxide coatings for easier demolding of polyisocyanurate foam. This innovation promises maintenance-free operations with dense, smooth films tha...
Energy-efficient townsend discharge vapor condensation technology
A patented technology utilizing Townsend discharge and electric field enhanced electron emission for energy-efficient vapor condensation, eliminating the need for cooling or compression. This approach condenses water vap...
Barrier coatings enabled by high-density cold plasma
An innovative beam plasma source developed to produce ultra-dense barrier coatings on plastic substrates, offering superior solvent barrier and wear-resistance properties suitable for packaging applications.
Electro-active adsorption technology for organic acid removal from water
A novel electro-active adsorption (EAA) technology designed to effectively capture small organic acids dissolved in water. Utilizing a non-uniform electric field, it enhances ion drift and adsorption using biochar-derive...
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