Innovative organometallic complex-based photoresists offer high sensitivity and etch resistance for EUV lithography, enabling nanoscale patterning with versatile applications in semiconductor manufacturing.
Organometallic complexes designed for high-performance EUV photoresists offer groundbreaking capabilities in semiconductor manufacturing. These photoresists provide exceptional EUV sensitivity and high etch resistance, crucial for fabricating intricate nanoscale patterns. Their modular molecular architecture allows for customization, making them suitable for both negative and positive-tone processes, particularly effective for nanoscale hole features.
Key features:
Photochemical behavior:
The technology is currently at TRL 3, having undergone initial proof of concept with ongoing efforts for further structural characterization and performance testing. Plans are in place for field evaluation and scalability exploration with industrial partners.
Korea University is a large, comprehensive private research university in Seoul, combining broad academic depth with a strong orientation to industry collaboration. Its integration with a multi-hospital academic medical system enables clinical studies, access to real‑world evidence, and practical pathways to translation. Partnerships are enabled by contract research, corporate‑sponsored labs, consortia, and a technology transfer office for IP, licensing, and startup formation, with on‑campus incubators and prototyping spaces connecting companies to talent. Research is supported by competitive national funding, including programs from the National Research Foundation of Korea and other ministries, and an industry liaison function simplifies access to faculty expertise and shared instrumentation.