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Private Company
Low-temperature technologies for ultra-high-purity chemical recycling
  • Background
  • What we're looking for
  • What we can offer you
  • Q&A
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Background

We are a global leader in advanced materials, with expertise in high-purity chemicals, high-performance polymers and electronic materials, driving innovation in the semiconductor industry. In recent years, the demand for semiconductors has been continuously expanding, leading to a significant increase in the usage of chemicals in semiconductor manufacturing processes. Among these chemicals, ultra-high-purity sulfuric acid is widely used in semiconductor cleaning and surface preparation processes due to its strong oxidative and contaminant removal capabilities. 

 

Recycling technologies for chemicals used in semiconductor processes have been gaining attention to reduce environmental impact and promote efficient resource utilization. Because semiconductor manufacturing requires extremely low levels of metallic, particulate and organic impurities, maintaining sulfuric acid purity during recycling is highly challenging. Conventional recycling approaches face limitations related to impurity removal efficiency and material compatibility, while process-derived contaminants may further impact acid stability. 

 

By leveraging technologies such as distillation/membrane separation, chemicals can be reused while maintaining ultra-high purity, enabling sustainable manufacturing processes. In the future, advancements in recycling technologies are expected to lead to the adoption of even more efficient systems.

What we're looking for

We are looking for novel recycling technologies for ultra-high-purity sulfuric acid used in semiconductor manufacturing processes. Ideal technologies would minimize energy consumption and reduce burden on production equipment.

Solutions of interest include:
  • Electrodialysis
  • Membrane filtration (RO/NF)
  • Ion exchange method
  • Chelating resin
  • Electrochemical purification
  • Vacuum-assisted low-temperature concentration
Our must-have requirements are:
  • Target recycling process temperature for ultra-high-purity sulfuric acid below 100°C
  • Target metal impurity concentration in recycled ultra-high-purity sulfuric acid below 10 ppt
Our nice-to-have's are:
  • Ambient temperature recycling processes
  • Metal impurity concentration below 5 ppt in recycled sulfuric acid
  • Recycling rate above 99%
What's out of scope:
  • Spent acid combustion process
  • Evaporation/distillation operating above 100°C
Acceptable technology readiness levels (TRL):
Levels 3-6
What we can offer you
Eligible partnership models:
Sponsored researchCo-developmentLicensingPilot or trial engagement
Benefits:
Sponsored Research
Funding is proposal dependent and typically ranges from 50,000 - 100,000 USD for a proof-of-concept study to demonstrate industrial relevance.
Facilities and Services
Access to a leading research and innovation hub in nanoelectronics and digital technologies for validation, provided the technology demonstrates industrial relevance.
Q&A with the company

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Q.
Need a complete list of contaminants and their concentrations. Which ones would you want removed and to what extent.
4
A.
Thank you for asking. We answer with some typical ingredients as below. We are seeking a purification technique for sulfuric acid/hydrogen peroxide mixture waste liquid. H2SO4: 60-80% in the mixture waste liquid >> target; above 96%, H2O2: 0.1~3% in the mixture waste liquid >> target; below 0.01ppm, KMnO4-reducing substances (SO2): ≦1ppm, NH4 (Ammonium salts)/PO4 (Phosphates): ≦0.05ppm, Cl (Chlorides)/ NO3 (Nitrates): ≦0.1ppm, Metals detected by ICP-MS: ≦10ppt
Team Member, Reviewer, Private Company
June 9, 2026
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0
Q.
Are you looking to remove just trace metal impurities? Also, will you provide ICPMS services capable of detecting low ppt level metal ions for this collaboration?
2
A.
Thank you for confirming two. We are seeking a purification technique for sulfuric acid/hydrogen peroxide mixture waste liquid. Therefore, in addition to removing metals, we want to remove hydrogen peroxide and increase the purity of the sulfuric acid(above 96.0%). Regarding ICP-MS analysis, we won't be able to provide it.
Team Member, Reviewer, Private Company
June 9, 2026
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0
Q.
Would the sponsor consider novel chelating resin chemistries that are bio-derived, where the chelating moiety is a natural metal-binding biopolymer immobilised on an acid-resistant support?
1
A.
Thank you for asking. While biomaterials are undesirable from a durability standpoint, they are in the scope if they offer sufficient durability.
Team Member, Reviewer, Private Company
June 15, 2026
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